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CN103620730A 用于控制抗蚀剂特征中的临界尺寸和粗糙度的方法和系统 有权

用于控制抗蚀剂特征中的临界尺寸和粗糙度的方法和系统
Abstract:
本发明提供一种处理具有初始线粗糙度和初始临界尺寸的光致抗蚀剂凸纹特征(402)的方法。所述方法可包含在第一暴露中以第一角范围和第一剂量率朝向光致抗蚀剂引导离子(404)，所述第一剂量率用以将初始线粗糙度减小到第二线粗糙度。所述方法还可包含在第二暴露中以大于第一剂量率的第二离子剂量率朝向光致抗蚀剂凸纹特征引导离子，其中所述第二离子剂量率用以使光致抗蚀剂凸纹特征膨胀。
Abstract(English):

A method of treating a photoresist relief feature (402) having an initial line roughness and an initial critical dimension. The method may include the facing of photoresist directing ions (404) towards a first angular range and a first dose rate in a first exposure, wherein a first dose rate is configured to reduce the initial line roughness to a second liner roughness. The method may also include the facing of photoresist relief feature directing ions towards a second dose rate which is in a second exposure and larger than the first dose rate, wherein the second ion dose rate is configured to swell the photoresist relief feature.

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