The invention relates to a processing method of a double-layer embroidery sticker with an incomplete effect. The double-layer embroidery sticker is formed by matching a top layer material with a first pattern part and a bottom layer material with a second pattern part, wherein after the first pattern part is matched with the second pattern part, the first pattern part has an incomplete region relative to the second pattern part, and a pattern formed by the pattern of the first pattern part matched with the incomplete region can be matched and superposed with the pattern of the second pattern part. When processed, the incomplete region with a shorter contour line is cut on the top layer material first, and then after the bottom layer material is bonded with the top layer material with the incomplete region, the contour line of the appearance of the double-layer material is further cut. The processing method of the double-layer embroidery sticker can significantly reduce power consumption of a cutting machine, saves cutting time, and reduces the difficulty in contraposition of the double-layer embroidery sticker, and the finished product is integral and convenient to be further stitched onto an embroidery carrier.