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Invention Grant
CN107111250B 度量方法、计算机产品和系统 有权

度量方法、计算机产品和系统
Abstract:
一种方法包括根据目标的测量值来确定目标的结构不对称的类型，以及执行目标的光学测量的模拟以确定与不对称类型相关联的不对称参数的值。一种方法包括执行目标的光学测量的模拟以确定与根据目标的测量值确定的目标的结构不对称的类型相关联的不对称参数的值，以及分析不对称参数对于与目标相关联的目标形成参数的变化的敏感度。一种方法包括使用被目标衍射的辐射的测量参数来确定目标的结构不对称参数，以及基于对于与目标相关联的目标形成参数的变化最不敏感的结构不对称参数来确定目标的测量光束的属性。
Abstract(English):

A method including determining a type of structural asymmetry of the target from measured values of the target, and performing a simulation of optical measurement of the target to determine a value of an asymmetry parameter associated with the asymmetry type. A method including performing a simulation of optical measurement of a target to determine a value of an asymmetry parameter associated with a type of structural asymmetry of the target determined from measured values of the target, and analyzing a sensitivity of the asymmetry parameter to change in a target formation parameter associated with the target. A method including determining a structural asymmetry parameter of a target using a measured parameter of radiation diffracted by the target, and determining a property of a measurement beam of the target based on the structural asymmetry parameter that is least sensitive to change in a target formation parameter associated with the target.

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