The invention belongs to the field related to atomic layer deposition preparation instruments, and discloses an atomic layer deposition device for coating large-scale micro-nano particles. The devicecomprises a particle container and a reaction cavity, wherein a source inlet is formed in the lower end of the reaction cavity, an air inlet pipe used for inputting a precursor and a carrier gas is arranged in the source inlet in a sealed mode, the upper end of the reaction cavity is provided with a cavity door, the particle container can be freely placed in the reaction cavity, or is taken out ofthe reaction cavity, an air inlet hole is formed in the lower end of the particle container, and the air inlet pipe enters an inner cavity of the particle container through the air inlet hole. According to the atomic layer deposition device, the airflow internal circulation method and the airflow external circulation method can be effectively combined, so that the collision between the particlesand the contact probability between the particles and gas molecules are remarkably increased, the reaction rate and the precursor utilization rate are improved, and high-quality and high-efficiency coating of the large-scale micro-nano particles is realized.