An embodiment of the invention provides a method and a device for testing silicon chip edge resistance after etching. According to the method, through inputting a preset electric signal into a testingpoint on the front surface of the silicon chip after etching, and furthermore acquiring an output electric signal at a testing point on the back surface which is deviated from the front surface, theedge resistance of the silicon chip after etching is calculated according to a preset electric signal and an output electric signal. The method and the device for testing the silicon chip edge resistance after etching according to the embodiment can be used for testing all etched silicon chips, thereby improving testing efficiency and testing data accuracy, and further improving production efficiency and product yield.