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Invention Publication
CN110119067A 用于光刻胶的热致酸生成剂 无效 - 撤回

用于光刻胶的热致酸生成剂
Abstract:
提供了新的光刻胶组合物，其包含一种组分，该组分包含热致酸生成剂和遏制剂。本发明优选的光刻胶可以包含：具有对光致酸不稳定的基团的树脂；光致酸生成剂化合物；以及至少一种热致酸生成剂和至少一种遏制剂，所述遏制剂用来改进线宽粗糙度和光刻速度。
Abstract(English):

New photoresist compositions are provided that comprise a component that comprises a thermal acid generator and a quencher. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and at least one thermal acid generator and at least one quencher that can function to improve line width roughness and photospeed.

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