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CN110325921A 微调过程模型的方法 有权

微调过程模型的方法
Abstract:
本发明中披露了构造过程模型的方法，该过程模型用于根据在不同处理条件下产生的图案模拟光刻术的产品的特性。所述方法使用该被模拟的特性的变化与被测量的特性的变化之间的偏差以调整该过程模型的参数。
Abstract(English):

Disclosed herein are methods of constructing a process model for simulating a characteristic of a product of lithography from patterns produced under different processing conditions. The methods use adeviation between the variation of the simulated characteristic and the variation of the measured characteristic to adjust the parameters of the process model.

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