Invention Grant
- Patent Title: METHOD OF MANUFACTURING OF A MICROMACHINE
- Patent Title (中): 微器件及产生微器件方法
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Application No.: EP99947884.5Application Date: 1999-10-13
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Publication No.: EP1041036B1Publication Date: 2007-05-09
- Inventor: KAMIJIMA, Shunji Seiko Epson Corporation , YONEKUBO, Masatoshi Seiko Epson Corporation , TAKEDA, Takashi Seiko Epson Corporation , NISHIKAWA, Takao Seiko Epson Corporation
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: 4-1, Nishishinjuku 2-chome, Shinjuku-ku Tokyo 160-0811 JP
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: 4-1, Nishishinjuku 2-chome, Shinjuku-ku Tokyo 160-0811 JP
- Agency: Sturt, Clifford Mark
- Priority: JP29121898 19981013; JP6716699 19990312
- International Announcement: WO2000021877 20000420
- Main IPC: B81B1/00
- IPC: B81B1/00 ; B81B3/00
Abstract:
A micromachine and a method of manufacturing the same which are suitable as or for a micromachine having a first dynamic fine structural portion constituting a driving portion, and a second static fine structural portion performing a switching function or a function of an optical element, the method comprising forming the second static fine structural portion on the first dynamic fine structural portion, or superposing the second static fine structural portion thereon and die transferring the same thereto, whereby the method enables the second fine structure to be formed without using at least a complicated step, such as a silicon process in an intermediate stage of the method, and into a complicated shape easily with a high reproducibility, and contributes to the improvement of the productivity. Especially, when a plurality of elements are arranged in an arrayed state as in a spatial light modulator, the die transfer techniques enable the second fine structure to be reproduced stably as compared with the techniques using a silicon process for forming all parts of a micromachine, whereby the subject method reduces the probability of occurrence of defects to a remarkably low level and contributes to the improvement of the yield.
Public/Granted literature
- EP1041036A1 MICROMACHINE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2000-10-04
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