Stage system calibration method, stage system and lithographic apparatus comprising such stage system.

Invention Patent

NL1036742A1 Stage system calibration method, stage system and lithographic apparatus comprising such stage system. 未知

Patent Title: Stage system calibration method, stage system and lithographic apparatus comprising such stage system.
Application No.: NL1036742

Application Date: 2009-03-19
Publication No.: NL1036742A1

Publication Date: 2009-10-20
Inventor: BUTLER HANS , PASCH ENGELBERTUS ANTONIUS FRANSISCUS VAN DER
Applicant: ASML NETHERLANDS BV
Assignee: ASML NETHERLANDS BV
Current Assignee: ASML NETHERLANDS BV
Priority: US7124808 2008-04-18
Main IPC: G03F9/00
IPC: G03F9/00 ; H01L21/68

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IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F9/00	原版、蒙片、片框、照片、图纹表面的对准或定位，例如自动地（G03F7/22优先；照相蒙片的制备入G03F1/00；在复制用的照相印片设备中的入G03B27/00）