Invention Grant
- Patent Title: Structured light projection using a compound patterned mask
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Application No.: US15082805Application Date: 2016-03-28
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Publication No.: US10001583B2Publication Date: 2018-06-19
- Inventor: Dmitry Bakin , Matthias Gloor , Moshe Doron
- Applicant: Heptagon Micro Optics Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: Heptagon Micro Optics Pte. Ltd.
- Current Assignee: Heptagon Micro Optics Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Fish & Richardson P.C.
- Main IPC: G01V8/20
- IPC: G01V8/20 ; G03B17/54 ; G03B21/20

Abstract:
The present disclosure describes structured light projection in which a structured light projector includes a light emitter and a compound patterned mask. The mask includes a spacer substrate that is transparent to a wavelength of light emitted by the light emitter. On a first side of the spacer substrate is a first reflective surface having apertures therein to allow light to pass through. Lenses are arranged to focus light, produced by the light emitter, toward the apertures in the first reflective surface. A second reflective surface on a second side of the spacer substrate opposite the first side has apertures therein to allow light passing through the spacer substrate to exit the compound patterned mask.
Public/Granted literature
- US20160291200A1 STRUCTURED LIGHT PROJECTION USING A COMPOUND PATTERNED MASK Public/Granted day:2016-10-06
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