Invention Grant
- Patent Title: Opaque quartz glass and method for its production
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Application No.: US15118368Application Date: 2015-02-16
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Publication No.: US10005693B2Publication Date: 2018-06-26
- Inventor: Satori Hirai , Nobusuke Yamada , Kazuyoshi Arai
- Applicant: TOSOH CORPORATION
- Applicant Address: JP Shunan-shi, Yamaguchi
- Assignee: TOSOH CORPORATION
- Current Assignee: TOSOH CORPORATION
- Current Assignee Address: JP Shunan-shi, Yamaguchi
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-027910 20140217; JP2014-040971 20140303; JP2014-094127 20140430
- International Application: PCT/JP2015/054129 WO 20150216
- International Announcement: WO2015/122517 WO 20150820
- Main IPC: C03C11/00
- IPC: C03C11/00 ; C03B19/06 ; C03B19/08

Abstract:
To provide opaque quartz glass having no water absorbing properties and being excellent in infrared light shielding properties, and a method for its production. In the production of opaque quartz glass of the present invention, a fine amorphous silica powder and a pore forming agent are mixed, then molded and heated at a predetermined temperature, to obtain opaque quartz glass wherein contained pores are closed pores, the average pore size of pores is from 5 to 20 μm, and the content density of pores is high, whereby the heat shielding properties are high.
Public/Granted literature
- US20170174560A1 OPAQUE QUARTZ GLASS AND METHOD FOR ITS PRODUCTION Public/Granted day:2017-06-22
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