Invention Grant
- Patent Title: System and method for integrated inductor
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Application No.: US15256305Application Date: 2016-09-02
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Publication No.: US10008318B2Publication Date: 2018-06-26
- Inventor: Gunther Mackh , Carsten Ahrens , Klemens Pruegl
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Main IPC: H01F5/00
- IPC: H01F5/00 ; H01F27/28 ; H01L23/522 ; H01L27/08 ; H01F41/04 ; H01L49/02 ; H05K3/10 ; H01F17/04 ; H01F27/255 ; H01F17/00
Abstract:
In one embodiment, an inductor has a substrate, a conductor disposed above the substrate and a seamless ferromagnetic material surrounding at least a first portion of the conductor.
Public/Granted literature
- US20160372256A1 System and Method for Integrated Inductor Public/Granted day:2016-12-22
Information query
