Invention Grant
- Patent Title: Semiconductor structure and manufacturing method thereof
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Application No.: US15152274Application Date: 2016-05-11
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Publication No.: US10008467B2Publication Date: 2018-06-26
- Inventor: Chun-Lin Lu , Kai-Chiang Wu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/00 ; H01L23/498

Abstract:
A semiconductor structure includes a semiconductor substrate, a pad, a circuit board, a first bump, and a second bump. The pad is disposed on a top surface of the semiconductor substrate. The circuit board includes a contact area corresponding to the pad on the top surface of the semiconductor substrate. The first bump is between the pad on the top surface of the semiconductor substrate and the contact area, wherein the contact area includes a non-metallic surface. The second bump is adjacent the first bump, wherein a first central width of the first bump is larger than a second central width of the second bump.
Public/Granted literature
- US20160254242A1 SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2016-09-01
Information query
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