Invention Grant
- Patent Title: Target supply apparatus and EUV light generating apparatus
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Application No.: US15019577Application Date: 2016-02-09
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Publication No.: US10009991B2Publication Date: 2018-06-26
- Inventor: Toshihiro Nishisaka , Yoshiaki Kato , Fumio Iwamoto
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.
Public/Granted literature
- US20160165708A1 TARGET SUPPLY APPARATUS AND EUV LIGHT GENERATING APPARATUS Public/Granted day:2016-06-09
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