Invention Grant
- Patent Title: Liquid ejection apparatus and method for manufacturing liquid ejection apparatus
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Application No.: US15673720Application Date: 2017-08-10
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Publication No.: US10011110B2Publication Date: 2018-07-03
- Inventor: Taiki Tanaka , Takashi Yoshikawa
- Applicant: BROTHER KOGYO KABUSHIKI KAISHA
- Applicant Address: JP Nagoya-Shi, Aichi-Ken
- Assignee: BROTHER KOGYO KABUSHIKI KAISHA
- Current Assignee: BROTHER KOGYO KABUSHIKI KAISHA
- Current Assignee Address: JP Nagoya-Shi, Aichi-Ken
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Priority: JP2015-192764 20150930
- Main IPC: B41J2/14
- IPC: B41J2/14 ; B41J2/16 ; H01L41/09 ; H01L41/29 ; H01L41/047

Abstract:
A liquid ejection apparatus is disclosed. One apparatus includes a piezoelectric element. The piezoelectric element includes an upper electrode and a lower electrode. The lower electrode has a partial overlapping portion and a non-overlapping portion. The partial overlapping portion at least partially overlaps the pressure chamber. The partial overlapping portion of the lower electrode has two ends in the transverse direction. The upper electrode has two ends in the transverse direction. A distance from the center of the pressure chamber in the transverse direction to one of the two ends of the upper electrode in the transverse direction is smaller than a distance from the center of the pressure chamber in the transverse direction to a corresponding one of the two ends of the partial overlapping portion in the transverse direction.
Public/Granted literature
- US20180086070A1 LIQUID EJECTION APPARATUS AND METHOD FOR MANUFACTURING LIQUID EJECTION APPARATUS Public/Granted day:2018-03-29
Information query
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