Invention Grant
- Patent Title: Alkoxide compound, thin film-forming starting material, and thin film formation method
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Application No.: US15318755Application Date: 2015-07-16
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Publication No.: US10011623B2Publication Date: 2018-07-03
- Inventor: Atsushi Sakurai , Masako Hatase , Tomoharu Yoshino , Masaki Enzu
- Applicant: ADEKA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: ADEKA CORPORATION
- Current Assignee: ADEKA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2014-159270 20140805
- International Application: PCT/JP2015/070385 WO 20150716
- International Announcement: WO2016/021385 WO 20160211
- Main IPC: C07F15/06
- IPC: C07F15/06 ; C07F15/04 ; C07C251/08 ; C07F7/08 ; C07C251/76 ; C07F7/10 ; C23C16/18
Abstract:
The alkoxide compound of the present invention is characteristically represented by the following general formula (I):
Public/Granted literature
- US20170129912A1 ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM FORMATION METHOD, AND ALCOHOL COMPOUND Public/Granted day:2017-05-11
Information query
