Invention Grant
- Patent Title: Production method for polishing-material particles
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Application No.: US14426071Application Date: 2013-09-03
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Publication No.: US10011752B2Publication Date: 2018-07-03
- Inventor: Atsushi Takahashi , Natsuki Ito , Keisuke Mizoguchi , Akihiro Maezawa
- Applicant: KONICA MINOLTA, INC.
- Applicant Address: JP Tokyo
- Assignee: Konica Minolta, Inc.
- Current Assignee: Konica Minolta, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Cozen O'Connor
- Priority: JP2012-194691 20120905
- International Application: PCT/JP2013/073640 WO 20130903
- International Announcement: WO2014/038536 WO 20140313
- Main IPC: C09K3/14
- IPC: C09K3/14

Abstract:
A production method for polishing-material particles, comprising: forming an inner layer having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; adding a prepared aqueous solution, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an outer layer on the outer side of the inner layer; using solid-liquid separation to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the reaction solution in which the surface of the outer layer is formed is in the range of 60-90 mol % inclusive.
Public/Granted literature
- US20150232728A1 Production Method For Polishing-Material Particles Public/Granted day:2015-08-20
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