Invention Grant
- Patent Title: Manganese-containing film forming compositions, their synthesis, and use in film deposition
-
Application No.: US14986313Application Date: 2015-12-31
-
Publication No.: US10011903B2Publication Date: 2018-07-03
- Inventor: Stefan Wiese , Satoko Gatineau , Jean-Marc Girard
- Applicant: L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude
- Applicant Address: FR Paris
- Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee Address: FR Paris
- Agent Patricia E. McQueeney
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/42 ; C23C16/18 ; C23C16/30 ; C23C16/36
Abstract:
Manganese-containing film forming compositions, their preparation, and their use for the vapor deposition of films are disclosed. The manganese-containing film forming compositions comprise silylamide-containing precursors, particularly {Mn[N(SiMe2Et)2]2}2.
Public/Granted literature
- US20160194755A1 MANGANESE-CONTAINING FILM FORMING COMPOSITIONS, THEIR SYNTHESIS, AND USE IN FILM DEPOSITION Public/Granted day:2016-07-07
Information query
IPC分类:
