Invention Grant
- Patent Title: Resist composition and pattern forming process
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Application No.: US15460454Application Date: 2017-03-16
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Publication No.: US10012903B2Publication Date: 2018-07-03
- Inventor: Jun Hatakeyama , Koji Hasegawa
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ESTU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ESTU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2016-063442 20160328; JP2016-175472 20160908
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; C08F220/28 ; C08F220/30 ; G03F7/16 ; C08F220/36 ; G03F7/004 ; G03F7/38 ; G03F7/32 ; C08F220/52 ; G03F7/038
Abstract:
A resist composition is provided comprising a polymer comprising recurring units (a) having a succinimide structure and recurring units (b) containing a group capable of polarity switch with the aid of acid. The resist composition suppresses acid diffusion, exhibits a high resolution, and forms a pattern of satisfactory profile with low edge roughness.
Public/Granted literature
- US20170277037A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS Public/Granted day:2017-09-28
Information query
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