Invention Grant
- Patent Title: Electron source, X-ray source and device using the X-ray source
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Application No.: US14904061Application Date: 2015-08-19
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Publication No.: US10014148B2Publication Date: 2018-07-03
- Inventor: Huaping Tang , Zhiqiang Chen , Yuanjing Li , Yonggang Wang , Zhanfeng Qin
- Applicant: Nuctech Company Limited
- Applicant Address: CN Beijing
- Assignee: Nuctech Company Limited
- Current Assignee: Nuctech Company Limited
- Current Assignee Address: CN Beijing
- Agency: Knobbe Martens Olson & Bear, LLP
- Priority: CN201410419359 20140825
- International Application: PCT/CN2015/087488 WO 20150819
- International Announcement: WO2016/029811 WO 20160303
- Main IPC: A61B6/03
- IPC: A61B6/03 ; A61B6/04 ; H01J37/26 ; H01J35/06 ; H01J35/14

Abstract:
The present disclosure is directed to an electron source and an X-ray source using the same. The electron source of the present invention comprises: at least two electron emission zones, each of which comprises a plurality of micro electron emission units, wherein the micro electron emission unit comprises: a base layer, an insulating layer on the base layer, a grid layer on the insulating layer, an opening in the grid layer, and an electron emitter that is fixed at the base layer and corresponds to a position of the opening, wherein the micro electron emission units in the same electron emission zone are electrically connected and simultaneously emit electrons or do not emit electrons at the same time, and wherein different electron emission zones are electrically partitioned.
Public/Granted literature
- US20170162359A1 ELECTRON SOURCE, X-RAY SOURCE AND DEVICE USING THE X-RAY SOURCE Public/Granted day:2017-06-08
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