Invention Grant
- Patent Title: Wafer boat support table and heat treatment apparatus using the same
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Application No.: US15352816Application Date: 2016-11-16
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Publication No.: US10014199B2Publication Date: 2018-07-03
- Inventor: Tomoyuki Nagata , Tomoya Hasegawa
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2015-225407 20151118
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/673 ; H01L21/677

Abstract:
There is provided a wafer boat support table that supports a wafer boat having a plurality of posts from below, the plurality of posts being configured to arrange and support a plurality of wafers at intervals in a vertical direction, the wafer boat support table including: a plurality of support points installed on each of linear lines defined by connecting a center of the wafer boat and the plurality of posts and configured to support a bottom surface of the wafer boat while being brought into contact with the bottom surface of the wafer boat.
Public/Granted literature
- US20170140964A1 WAFER BOAT SUPPORT TABLE AND HEAT TREATMENT APPARATUS USING THE SAME Public/Granted day:2017-05-18
Information query
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