Invention Grant
- Patent Title: Array substrate with thin film transistor and method of manufacturing the same
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Application No.: US14436843Application Date: 2014-09-11
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Publication No.: US10014329B2Publication Date: 2018-07-03
- Inventor: Jinchao Bai , Xiangqian Ding , Yao Liu , Liangliang Li , Zongjie Guo
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE Technology Group Co., Ltd.,Beijing BOE Display Technology Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.,Beijing BOE Display Technology Co., Ltd.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Banner & Witcoff, Ltd.
- Priority: CN201410126538 20140331
- International Application: PCT/CN2014/086301 WO 20140911
- International Announcement: WO2015/149482 WO 20151008
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/66 ; H01L29/78 ; G02F1/13

Abstract:
An array substrate and manufacturing method thereof and display device are provided. The method of manufacturing the array substrate includes forming a pattern including a gate electrode, a gate line, a common electrode line and a gate insulating layer on a substrate; forming a pattern including a data line, a source electrode, a drain electrode and an active layer; forming a pattern including an insulating interlayer over the pattern of the source electrode, the drain electrode and the active layer; forming a pattern including a first transparent electrode over the insulating interlayer; forming a pattern including a passivation layer over the first transparent electrode; and forming a pattern including a second transparent electrode over the passivation layer. The method can efficiently prevent the ITO process polluting the TFT channel.
Public/Granted literature
- US20160254289A1 ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY DEVICE Public/Granted day:2016-09-01
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