Invention Grant
- Patent Title: Silica content substrate such as for use harsh environment circuits and high frequency antennas
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Application No.: US15416663Application Date: 2017-01-26
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Publication No.: US10015879B2Publication Date: 2018-07-03
- Inventor: Daniel Warren Hawtof , Archit Lal , Jen-Chieh Lin , Gary Richard Trott
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Russell S. Magaziner
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H01Q9/04 ; H01Q1/12 ; H05K1/03 ; H05K1/11

Abstract:
A high silica content substrate, such as for a device, is provided. The substrate has a high silica content and is thin. The substrate may include a surface with a topography or profile that facilitates bonding with a conductive metal layer, such as a metal layer for a circuit or antenna. The substrate may be flexible, have high temperature resistance, very low CTE, high strength and/or be non-reactive. The substrate may be suitable for use in circuits intended for use in high temperature environments, low temperature environments, reactive environments, or other harsh environments. The substrate may be suitable for high frequency antenna applications.
Public/Granted literature
- US20170215270A1 SILICA CONTENT SUBSTRATE SUCH AS FOR USE HARSH ENVIRONMENT CIRCUITS AND HIGH FREQUENCY ANTENNAS Public/Granted day:2017-07-27
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