Invention Grant
- Patent Title: System and method for hyperspectral imaging metrology
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Application No.: US15233648Application Date: 2016-08-10
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Publication No.: US10018560B2Publication Date: 2018-07-10
- Inventor: Andrew V. Hill
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G02B27/10
- IPC: G02B27/10 ; G01N21/47 ; G02B3/00 ; G02B27/42 ; G01N21/84

Abstract:
A metrology system includes an illumination source configured to generate an illumination beam, one or more illumination optics configured to direct the illumination beam to a sample, one or more collection optics configured to collect illumination emanating from the sample, a detector, and a hyperspectral imaging sub-system. The hyperspectral imaging sub-system includes a dispersive element positioned at a pupil plane of the set of collection optics configured to spectrally disperse the collected illumination, a lens array including an array of focusing elements, and one or more imaging optics. The one or more imaging optics combine the spectrally-dispersed collected illumination to form an image of the pupil plane on the lens array. The focusing elements of the lens array distribute the collected illumination on the detector in an arrayed pattern.
Public/Granted literature
- US20170219487A1 System and Method for Hyperspectral Imaging Metrology Public/Granted day:2017-08-03
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