Invention Grant
- Patent Title: Output resistance testing structure
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Application No.: US14711900Application Date: 2015-05-14
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Publication No.: US10018660B2Publication Date: 2018-07-10
- Inventor: Wen-Shen Chou , Po-Zeng Kang , Yung-Chow Peng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G01R27/02
- IPC: G01R27/02 ; G01R27/08 ; G01R31/28

Abstract:
A testing structure includes a first transistor having a first dopant type connected to a current source. The testing structure further includes a second transistor having a second dopant type, opposite to the first dopant type. The second transistor is connected to a device under test (DUT). The second transistor is connected in series with the first transistor in a cascode arrangement. The cascode arrangement is capable of measuring an output resistance of the DUT of greater than 1 mega-ohm (MΩ).
Public/Granted literature
- US20150362539A1 OUTPUT RESISTANCE TESTING STRUCTURE AND METHOD OF USING THE SAME Public/Granted day:2015-12-17
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