Invention Grant
- Patent Title: Guide pattern data correcting method, pattern forming method, and computer readable record medium
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Application No.: US15377472Application Date: 2016-12-13
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Publication No.: US10019547B2Publication Date: 2018-07-10
- Inventor: Hiroki Yonemitsu
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2013-29071 20130218
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/40 ; G03F7/38 ; B81C1/00 ; G03F7/00 ; B82Y40/00
Abstract:
According to one embodiment, a guide pattern data correcting method is for correcting guide pattern data of a physical guide for formation of a polymer material to be microphase-separated. The physical guide has a plurality of concave portions in the guide pattern data, and at least two concave portions out of the plurality of concave portions are connected to each other. The guide pattern data is subjected to correction by shifting or rotation of at least either of the two connected concave portions.
Public/Granted literature
- US20170091369A1 GUIDE PATTERN DATA CORRECTING METHOD, PATTERN FORMING METHOD, AND COMPUTER READABLE RECORD MEDIUM Public/Granted day:2017-03-30
Information query
