Invention Grant
- Patent Title: Static random access memory
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Application No.: US15158103Application Date: 2016-05-18
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Publication No.: US10020312B2Publication Date: 2018-07-10
- Inventor: Huai-Ying Huang , Jordan Hsu , Tang-Hsuan Chung , Shau-Wei Lu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L23/528 ; H01L27/092 ; H01L27/02 ; G11C11/419 ; G11C11/412 ; H01L23/532

Abstract:
A Static Random Access Memory (SRAM) Cell includes a first gate electrode layer covering a channel region of a read pull-down transistor, a second gate electrode layer covering channel regions of a first pull-down transistor and a first pull-up transistor, a third gate electrode layer covering a channel region of a second pass-gate transistor, a fourth gate electrode layer covering a channel region of a read pass-gate transistor, a fifth gate electrode layer covering a channel region of a first pass-gate transistor, and a sixth gate electrode layer covering channel regions of a second pull-down transistor and a second pull-up transistor. The first and second gate electrode layers are separated from each other by a first dielectric layer interposed therebetween, and are electrically connected to each other by a first interconnection layer formed thereon.
Public/Granted literature
- US20170338233A1 STATIC RANDOM ACCESS MEMORY Public/Granted day:2017-11-23
Information query
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