Static random access memory
Abstract:
A Static Random Access Memory (SRAM) Cell includes a first gate electrode layer covering a channel region of a read pull-down transistor, a second gate electrode layer covering channel regions of a first pull-down transistor and a first pull-up transistor, a third gate electrode layer covering a channel region of a second pass-gate transistor, a fourth gate electrode layer covering a channel region of a read pass-gate transistor, a fifth gate electrode layer covering a channel region of a first pass-gate transistor, and a sixth gate electrode layer covering channel regions of a second pull-down transistor and a second pull-up transistor. The first and second gate electrode layers are separated from each other by a first dielectric layer interposed therebetween, and are electrically connected to each other by a first interconnection layer formed thereon.
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