Invention Grant
- Patent Title: Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element
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Application No.: US15720150Application Date: 2017-09-29
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Publication No.: US10023540B2Publication Date: 2018-07-17
- Inventor: Jiro Hikida , Kazuya Someya , Koichi Misumi , Dai Shiota
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2016-192368 20160929; JP2017-189228 20170928
- Main IPC: C07D233/56
- IPC: C07D233/56 ; C07D233/60 ; B01J20/22 ; B01J20/26 ; B01J20/32 ; H01L29/786 ; C09D133/14 ; G02F1/1335 ; H01L27/32 ; G02F1/1368 ; H01L51/52

Abstract:
To provide a hydrogen barrier agent capable of imparting hydrogen barrier performance to various materials; a hydrogen barrier film forming composition including the hydrogen barrier agent; a hydrogen barrier film including the hydrogen barrier agent; a method for producing a hydrogen barrier film, which uses the hydrogen barrier film forming composition; and an electronic element provided with the hydrogen barrier film. A compound having a specific structure including an imidazolyl group is used as the hydrogen barrier agent. Furthermore, the hydrogen barrier film forming composition is prepared by blending the above-mentioned hydrogen barrier agent into the base material component. In addition, the hydrogen barrier film is formed using the hydrogen barrier film forming composition.
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