Invention Grant
- Patent Title: High purity refractory metal powders and their use in sputtering targets which may have random texture
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Application No.: US14681660Application Date: 2015-04-08
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Publication No.: US10023953B2Publication Date: 2018-07-17
- Inventor: Patrick Hogan , Paul Aimone , Joseph Flanigan , Marcel Hagymasi , Helmut Haas
- Applicant: H.C. Starck Inc.
- Applicant Address: US MA Newton
- Assignee: H.C. STARCK INC.
- Current Assignee: H.C. STARCK INC.
- Current Assignee Address: US MA Newton
- Agency: Morgan, Lewis & Bockius LLP
- Main IPC: C23C14/34
- IPC: C23C14/34 ; B22F3/02 ; B22F3/15 ; C23C14/14 ; C22F1/18 ; H01J37/34 ; B22F1/00 ; B22F3/12 ; C22C1/04 ; B22F3/10
Abstract:
A method for making a sputtering target including steps of encapsulating and hot isostatically pressing at least one mass of metal powder (e.g., tantalum), having a particle size ranging from about 10 to about 1000 μm, with at least about 10 percent by weight of particles having a particle size greater than about 150 μm (for example, about 29 to about 56 percent (e.g., about 35 to about 47 percent) by weight of the particles in the at least one mass of metal powder having a particle size that is larger than 150 microns, but below about 250 μm), for defining at least a portion of a sputtering target body, having an essentially theoretical random and substantially uniform crystallographic texture.
Public/Granted literature
- US20150292081A1 HIGH PURITY REFRACTORY METAL POWDERS AND THEIR USE IN SPUTTERING TARGETS WHICH MAY HAVE RANDOM TEXTURE Public/Granted day:2015-10-15
Information query
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