Invention Grant
- Patent Title: Method for producing SiC single crystal
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Application No.: US15000871Application Date: 2016-01-19
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Publication No.: US10023975B2Publication Date: 2018-07-17
- Inventor: Nobuhira Abe
- Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Applicant Address: JP Toyota
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Toyota
- Agency: Oliff PLC
- Priority: JP2015-007222 20150116
- Main IPC: C30B15/10
- IPC: C30B15/10 ; C30B29/36 ; C30B9/06 ; C30B15/14

Abstract:
A method for producing a SiC single crystal by a solution method of bringing a seed crystal into contact with a Si solution of C and pulling up a SiC single crystal, the production method of a SiC single crystal including connecting the seed crystal to a seed crystal holder, disposing a cooling mechanism on the seed crystal holder, and promoting cooling of the seed crystal holder by the cooling mechanism in accordance with an increase in the pulling amount of the SiC single crystal.
Public/Granted literature
- US20160208409A1 METHOD FOR PRODUCING SIC SINGLE CRYSTAL Public/Granted day:2016-07-21
Information query
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