Invention Grant
- Patent Title: Sample measuring apparatus and sample measuring method
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Application No.: US15592316Application Date: 2017-05-11
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Publication No.: US10024779B2Publication Date: 2018-07-17
- Inventor: Kunihiko Matsui , Akiko Tamura
- Applicant: SYSMEX CORPORATION
- Applicant Address: JP Kobe-shi
- Assignee: SYSMEX CORPORATION
- Current Assignee: SYSMEX CORPORATION
- Current Assignee Address: JP Kobe-shi
- Agency: Metrolexis Law Group, PLLC
- Priority: JP2014-232242 20141114
- Main IPC: G01N33/48
- IPC: G01N33/48 ; G01N15/14 ; G01N33/49 ; G01N33/493

Abstract:
A sample measuring apparatus of an embodiment includes: a laser diode that applies laser light to a measurement specimen prepared from a sample; a detection unit that acquires optical information from a particle in the measurement specimen to which the laser light is applied; a drive circuit that supplies a direct-current drive signal to the laser diode; and a high-frequency conversion circuit that generates a potential that switches between a high level and a low level in a predetermined cycle to guide the drive signal outputted from the drive circuit to a second signal path which is different from a first signal path connected to the laser diode in the predetermined cycle, thereby converting the drive signal to be supplied to the laser diode into a high-frequency signal.
Public/Granted literature
- US20170241890A1 SAMPLE MEASURING APPARATUS AND SAMPLE MEASURING METHOD Public/Granted day:2017-08-24
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