Invention Grant
- Patent Title: Method of manufacturing lens array substrate, lens array substrate, electro-optical apparatus, and electronic equipment
-
Application No.: US14792561Application Date: 2015-07-06
-
Publication No.: US10025008B2Publication Date: 2018-07-17
- Inventor: Satoshi Ito
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: ALG Intellectual Property, LLC
- Priority: JP2014-145664 20140716
- Main IPC: G02B9/04
- IPC: G02B9/04 ; G02B3/00 ; G02F1/1335

Abstract:
In order to manufacture a lens array substrate including a multistage lens array which is formed on a translucent substrate, a first lens layer, a first translucent layer, a second lens layer, and a second translucent layer are stacked in order on a mother substrate. At the same time, a first metal layer is formed between the first lens layer and the first translucent layer, and in the removing of the first metal layer, the first metal layer is removed from a position overlapping with at least the center of a concavity in a plane view, and remains at least at an end portion of the mother substrate as a first buffer layer.
Public/Granted literature
Information query