Invention Grant
- Patent Title: Sulfonium compound, resist composition, and patterning process
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Application No.: US15690846Application Date: 2017-08-30
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Publication No.: US10025180B2Publication Date: 2018-07-17
- Inventor: Ryo Mitsui , Takayuki Fujiwara , Ryosuke Taniguchi , Koji Hasegawa , Masaki Ohashi
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2016-169793 20160831
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; C07C309/20 ; C07C309/02 ; C07C381/12 ; G03F7/38
Abstract:
A sulfonium salt containing an acid-eliminatable substituent group which is effective for improving contrast is highly soluble and uniformly dispersible. A resist composition comprising the sulfonium salt as photoacid generator forms a pattern with a high resolution, rectangularity, and reduced LWR.
Public/Granted literature
- US20180059543A1 SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2018-03-01
Information query
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