Invention Grant
- Patent Title: Polymer composition and photoresist comprising same
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Application No.: US13529541Application Date: 2012-06-21
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Publication No.: US10025181B2Publication Date: 2018-07-17
- Inventor: John W. Kramer
- Applicant: John W. Kramer
- Applicant Address: US MI Midland
- Assignee: DOW GLOBAL TECHNOLOGIES LLC
- Current Assignee: DOW GLOBAL TECHNOLOGIES LLC
- Current Assignee Address: US MI Midland
- Agency: Cantor Colburn LLP
- Main IPC: C08F220/38
- IPC: C08F220/38 ; G03F7/004 ; G03F7/30 ; C08F220/28 ; G03F7/039 ; C08F2/38 ; C08F220/18 ; C08F220/24

Abstract:
A polymer comprises the polymerized product of monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, and a photoacid-generating monomer; a chain transfer agent of the formula; wherein Z is a y valent C1-20 organic group, x is 0 or 1, Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl; and optionally, an initiator.
Public/Granted literature
- US20120328983A1 POLYMER COMPOSITION AND PHOTORESIST COMPRISING SAME Public/Granted day:2012-12-27
Information query
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