Invention Grant
- Patent Title: Smart selection and/or weighting of parameters for lithographic process simulation
-
Application No.: US12615004Application Date: 2009-11-09
-
Publication No.: US10025198B2Publication Date: 2018-07-17
- Inventor: Yu Cao , Wenjin Shao , Hanying Feng , Fei Du , Martin Snajdr
- Applicant: Yu Cao , Wenjin Shao , Hanying Feng , Fei Du , Martin Snajdr
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/20

Abstract:
The present invention generally relates to simulating a lithographic process, and more particularly to methods for smart selection and smart weighting when selecting parameters and/or kernels used in aerial image computation. According to one aspect, advantages in simulation throughput and/or accuracy can be achieved by selecting TCC kernels more intelligently, allowing highly accurate aerial images to be simulated using a relatively fewer number of TCC kernels than in the state of the art. In other words, the present invention allows for aerial images to be simulated with the same or better accuracy using much less simulation throughput than required in the prior art, all else being equal.
Public/Granted literature
- US20120005637A9 SMART SELECTION AND/OR WEIGHTING OF PARAMETERS FOR LITHOGRAPHIC PROCESS SIMULATION Public/Granted day:2012-01-05
Information query