Invention Grant
- Patent Title: Imprint lithography
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Application No.: US15834609Application Date: 2017-12-07
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Publication No.: US10025206B2Publication Date: 2018-07-17
- Inventor: Klaus Simon
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F9/00
- IPC: G03F9/00 ; B82Y40/00 ; B82Y10/00 ; G03F7/00

Abstract:
A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
Public/Granted literature
- US20180095361A1 IMPRINT LITHOGRAPHY Public/Granted day:2018-04-05
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