Invention Grant
- Patent Title: Cleaning a silicon photoconductor
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Application No.: US15511711Application Date: 2014-09-18
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Publication No.: US10025256B2Publication Date: 2018-07-17
- Inventor: Reut Diamant , Sasi Moalem , Boaz Tagansky
- Applicant: HEWLETT-PACKARD INDIGO B.V.
- Applicant Address: NL Amstelveen
- Assignee: HP Indigo B.V.
- Current Assignee: HP Indigo B.V.
- Current Assignee Address: NL Amstelveen
- Agency: HP Inc. Patent Department
- International Application: PCT/EP2014/069898 WO 20140918
- International Announcement: WO2016/041598 WO 20160324
- Main IPC: G03G21/00
- IPC: G03G21/00 ; G03G5/00
Abstract:
In an example implementation, a method of cleaning a silicon photoconductor includes contacting the silicon photoconductor with a base-peroxide solution, rinsing the silicon photoconductor with a liquid, and heating the silicon photoconductor to evaporate the liquid.
Public/Granted literature
- US20170293250A1 CLEANING A SILICON PHOTOCONDUCTOR Public/Granted day:2017-10-12
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