Invention Grant
- Patent Title: Thin film transistor substrate, display panel, and laser annealing method
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Application No.: US15556728Application Date: 2016-02-15
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Publication No.: US10026623B2Publication Date: 2018-07-17
- Inventor: Michinobu Mizumura
- Applicant: V TECHNOLOGY CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Kanagawa
- Agency: Osha Liang LLP
- Priority: JP2015-048394 20150311
- International Application: PCT/JP2016/054286 WO 20160215
- International Announcement: WO2016/143462 WO 20160915
- Main IPC: H01L21/324
- IPC: H01L21/324 ; H01L21/268 ; B23K26/06 ; H01L29/786 ; B23K26/066

Abstract:
A thin film transistor substrate includes a plurality of thin film transistors arranged in columns and rows respectively on a substrate. Each of the thin film transistors includes a laser annealed part in which an amorphous silicon layer that forms a channel region is laser annealed to be a polysilicon layer, each laser annealed part is disposed with a designed pitch in a scanning direction in which a laser light for laser annealing and the substrate move relatively to each other, and the laser annealed part is provided within a channel width formed in a direction orthogonal to the scanning direction and being narrower than the channel width.
Public/Granted literature
- US20180061661A1 THIN FILM TRANSISTOR SUBSTRATE, DISPLAY PANEL, AND LASER ANNEALING METHOD Public/Granted day:2018-03-01
Information query
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