- Patent Title: Polyimide resin, resin composition using same, and laminated film
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Application No.: US15121446Application Date: 2015-02-24
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Publication No.: US10026637B2Publication Date: 2018-07-17
- Inventor: Masao Tomikawa , Takuo Watanabe , Chungseo Lee
- Applicant: Toray Industries, Inc.
- Applicant Address: JP
- Assignee: Toray Industries, Inc.
- Current Assignee: Toray Industries, Inc.
- Current Assignee Address: JP
- Agency: DLA Piper LLP (US)
- Priority: JP2014-034900 20140226
- International Application: PCT/JP2015/055222 WO 20150224
- International Announcement: WO2015/129682 WO 20150903
- Main IPC: C08G77/455
- IPC: C08G77/455 ; H01L21/683 ; C09J179/08 ; H01L23/29 ; B32B7/12 ; B32B27/28 ; C08G73/10 ; H01L21/304 ; C09J7/28 ; C09J7/29 ; C08L61/28

Abstract:
A polyimide resin includes an acid anhydride residue; and a diamine residue, the polyimide resin including a residue of a polysiloxane diamine represented by Formula (1) in an amount of not less than 60% by mole in the total amount of the diamine residue: wherein, n is a natural number and an average value thereof calculated from the average molecular weight of the polysiloxane diamine is 45 to 200; R1 and R2, the same or different, each represent an alkylene group having 1 to 30 carbon atoms or a phenylene group; and R3 to R6, the same of different, each represent an alkyl group having 1 to 30 carbon atoms, a phenyl group or a phenoxy group.
Public/Granted literature
- US20160372357A1 POLYIMIDE RESIN, RESIN COMPOSITION USING SAME, AND LAMINATED FILM Public/Granted day:2016-12-22
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