Invention Grant
- Patent Title: MPS diode
-
Application No.: US15442359Application Date: 2017-02-24
-
Publication No.: US10026851B2Publication Date: 2018-07-17
- Inventor: Takaki Niwa , Takahiro Fujii , Masayoshi Kosaki , Tohru Oka
- Applicant: TOYODA GOSEI CO., LTD.
- Applicant Address: JP Kiyosu-Shi, Aichi-Ken
- Assignee: TOYODA GOSEI CO., LTD.
- Current Assignee: TOYODA GOSEI CO., LTD.
- Current Assignee Address: JP Kiyosu-Shi, Aichi-Ken
- Agency: McGinn IP Law Group, PLLC.
- Priority: JP2016-038851 20160301
- Main IPC: H01L29/15
- IPC: H01L29/15 ; H01L29/872 ; H01L29/868 ; H01L29/40 ; H01L29/36 ; H01L29/207 ; H01L29/20 ; H01L29/06

Abstract:
There is provided an MPS diode comprising a first semiconductor layer that is an N type; P-type semiconductor regions and N-type semiconductor regions that are arranged alternately on one surface of the first semiconductor layer; and a Schottky electrode that is in Schottky junction with the N-type semiconductor regions and is arranged to be adjacent to and in contact with at least part of the P-type semiconductor regions. A donor concentration in an area of the N-type semiconductor region that is adjacent to and in contact with the first semiconductor layer is lower than the donor concentration in an area of the first semiconductor layer that is adjacent to and in contact with the N-type semiconductor region and is lower than the donor concentration in an area of the N-type semiconductor region that is adjacent to and in contact with the Schottky electrode. This configuration improves a breakdown voltage under applying a reverse bias voltage and reduces a rising voltage under applying a forward bias voltage.
Public/Granted literature
- US20170256657A1 MPS DIODE Public/Granted day:2017-09-07
Information query
IPC分类: