Invention Grant
- Patent Title: Sintered body comprising LiCoO2, sputtering target, and production method for sintered body comprising LiCoO2
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Application No.: US14765991Application Date: 2014-03-12
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Publication No.: US10030302B2Publication Date: 2018-07-24
- Inventor: Yuichi Taketomi , Moriyoshi Kanamaru
- Applicant: KOBELCO RESEARCH INSTITUTE, INC.
- Applicant Address: JP Kobe-shi
- Assignee: KOBELCO RESEARCH INSTITUTE, INC.
- Current Assignee: KOBELCO RESEARCH INSTITUTE, INC.
- Current Assignee Address: JP Kobe-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-050929 20130313
- International Application: PCT/JP2014/056562 WO 20140312
- International Announcement: WO2014/142197 WO 20140918
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C23C14/34 ; H01M4/525 ; C04B35/01 ; C04B35/645 ; C23C14/08 ; H01J37/34 ; H01M4/04 ; H01M4/1391

Abstract:
Provided is a sintered body comprising LiCoO2 used for a sputtering target. The area A of a surface of the sintered body that corresponds to a sputtering surface is 200-1500 cm2 and the relative density of the entire sintered body is 75% or higher. When B1 represents the area of a region in which the area ratio that is occupied by pores is 10% or higher in the surface that corresponds to a sputtering surface, the ratio of B1 to the area A is 50% or higher, and the area B2 of a region having a specific resistance of 1.0×102 Ω-cm or smaller in the surface that corresponds to a sputtering surface occupies 25% or more of the area A.
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Information query
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