Invention Grant
- Patent Title: Lithographic apparatus
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Application No.: US14438482Application Date: 2013-09-23
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Publication No.: US10031422B2Publication Date: 2018-07-24
- Inventor: Andrey Nikipelov , Vadim Yevgenyevich Banine , Andrei Mikhailovich Yakunin
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2013/069713 WO 20130923
- International Announcement: WO2014/063878 WO 20140501
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20 ; G02B17/08 ; H05G2/00 ; G02B17/06

Abstract:
A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.
Public/Granted literature
- US20150286145A1 Lithographic Apparatus Public/Granted day:2015-10-08
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