Invention Grant
- Patent Title: Abnormal pattern analysis method, abnormal pattern analysis apparatus performing the same and storage medium storing the same
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Application No.: US14561759Application Date: 2014-12-05
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Publication No.: US10032167B2Publication Date: 2018-07-24
- Inventor: Hae Yong Yun , Kang Hee Lee , Ki Hyun Cho , Seong Jin Yoo
- Applicant: LG CNS CO., LTD.
- Applicant Address: KR Seoul
- Assignee: LG CNS CO., LTD.
- Current Assignee: LG CNS CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: KED & Associates, LLP
- Main IPC: G06K9/68
- IPC: G06K9/68 ; G06Q20/40 ; G06Q10/10

Abstract:
An abnormal pattern analysis method includes determining a service application associated with analysis data, selecting at least one abnormal pattern analysis module in an abnormal pattern analysis framework based on the determined service application and performing an analysis for the analysis data through the selected at least one abnormal pattern analysis module to detect an abnormal pattern.
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