Invention Grant
- Patent Title: Plasma source
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Application No.: US14651278Application Date: 2013-12-09
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Publication No.: US10032610B2Publication Date: 2018-07-24
- Inventor: Siegfried Krassnitzer , Juerg Hagmann
- Applicant: Oerlikon Surface Solutions AG, Trubbach
- Applicant Address: CH Pfäffikon SZ
- Assignee: OBERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Current Assignee: OBERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Current Assignee Address: CH Pfäffikon SZ
- Agency: Pearne & Gordon LLP
- Priority: DE102012024340 20121213
- International Application: PCT/EP2013/003704 WO 20131209
- International Announcement: WO2014/090389 WO 20140619
- Main IPC: C23C16/50
- IPC: C23C16/50 ; H01J37/32 ; H05H1/50

Abstract:
A plasma generating device includes a plasma source having a plasma source hollow body (1) and an electron emission unit (5) for emitting free electrons into the plasma source hollow body. The plasma source hollow body (1) has a first gas inlet (7a) and a plasma source opening (10) which forms an opening to a vacuum chamber. An anode has an anode hollow body (2). The anode hollow body (2) has a second gas inlet (7b) and an anode opening (11) which forms an opening to the vacuum chamber, and a voltage source (8) the negative pole of which is connected to the electron emission unit (5) and the positive pole of which is connected to the anode hollow body (2). The positive pole of the voltage source (8) is electrically connected by a first shunt (6a) to the plasma source hollow body.
Public/Granted literature
- US20150318151A1 PLASMA SOURCE Public/Granted day:2015-11-05
Information query
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