Invention Grant
- Patent Title: Semiconductor device
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Application No.: US14494409Application Date: 2014-09-23
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Publication No.: US10032736B2Publication Date: 2018-07-24
- Inventor: Yoshinao Miura , Takashi Nakamura , Tadatoshi Danno
- Applicant: RENESAS ELECTRONICS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2013-196874 20130924
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L23/00 ; H01L27/088 ; H01L27/02 ; H01L29/778 ; H01L27/06 ; H01L27/085 ; H01L23/482 ; H01L23/495 ; H01L29/20

Abstract:
A source interconnect and a drain interconnect are alternately provided between a plurality of transistor units. One bonding wire is connected to a source interconnect at a plurality of points. The other bonding wire is connected to a source interconnect at a plurality of points. In addition, one bonding wire is connected to a drain interconnect at a plurality of points. In addition, the other bonding wire is connected to a drain interconnect at a plurality of points.
Public/Granted literature
- US20150084135A1 SEMICONDUCTOR DEVICE Public/Granted day:2015-03-26
Information query
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