Invention Grant
- Patent Title: Solid-state imaging device, method for manufacturing same, and electronic device
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Application No.: US15302662Application Date: 2015-04-08
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Publication No.: US10032822B2Publication Date: 2018-07-24
- Inventor: Hiroshi Takahashi
- Applicant: SONY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sheridan Ross P.C.
- Priority: JP2014-086424 20140418
- International Application: PCT/JP2015/060924 WO 20150408
- International Announcement: WO2015/159766 WO 20151022
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L25/00

Abstract:
The present disclosure relates to a solid-state imaging device, a method for manufacturing the same, and an electronic device capable of increasing utilization efficiency of a substrate. The solid-state imaging device includes a first semiconductor substrate provided with a sensor circuit having a photoelectric conversion part, and a second semiconductor substrate and a third semiconductor substrate provided with respective circuits different from the sensor circuit. The first semiconductor substrate, the second semiconductor substrate, and the third semiconductor substrate are stacked on each other in three layers, and a metal element for an electrode constituting an electrode for external connection is disposed in the first semiconductor substrate. An electrode for a measuring terminal is disposed within the second semiconductor substrate or the third semiconductor substrate, and the first semiconductor substrate is stacked after performing a predetermined measurement. The present technology can be applied to a backside-illuminated solid-state imaging device, for example.
Public/Granted literature
- US20170033144A1 SOLID-STATE IMAGING DEVICE, METHOD FOR MANUFACTURING SAME, AND ELECTRONIC DEVICE Public/Granted day:2017-02-02
Information query
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