- Patent Title: Surface-emitting semiconductor laser, method for producing the same, surface-emitting semiconductor laser device, optical transmission device, and information processing device
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Application No.: US14810601Application Date: 2015-07-28
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Publication No.: US10033157B2Publication Date: 2018-07-24
- Inventor: Kazutaka Takeda , Junichiro Hayakawa , Akemi Murakami , Naoki Jogan , Takashi Kondo , Jun Sakurai
- Applicant: FUJI XEROX CO., LTD.
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: FUJI XEROX CO., LTD.
- Current Assignee: FUJI XEROX CO., LTD.
- Current Assignee Address: JP Minato-ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-171319 20140826
- Main IPC: H01S5/183
- IPC: H01S5/183 ; H01S5/022 ; H01S5/30 ; H01S5/343

Abstract:
A surface-emitting semiconductor laser includes a first semiconductor multilayer film reflector, an active region, a second semiconductor multilayer film reflector, and a current confinement layer including an oxidized region formed by selective oxidation. The current confinement layer includes a first semiconductor layer having a relatively high Al content, a second semiconductor layer that is adjacent to the first semiconductor layer on an active-region side of the first semiconductor layer and has a lower Al content than the first semiconductor layer, and a composition-gradient layer adjacent to the first semiconductor layer on a side of the first semiconductor layer which is opposite to the active-region side. A portion of the composition-gradient layer which faces the first semiconductor layer has a lower Al content than the first semiconductor layer.
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