Invention Grant
- Patent Title: Charged particle beam apparatus
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Application No.: US15217460Application Date: 2016-07-22
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Publication No.: US10037866B2Publication Date: 2018-07-31
- Inventor: Momoyo Enyama , Muneyuki Fukuda , Hideyuki Kazumi , Koichi Hamada , Sayaka Tanimoto
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2015-146549 20150724
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/22

Abstract:
A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.
Public/Granted literature
- US20170025251A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2017-01-26
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