Invention Grant
- Patent Title: Single-poly nonvolatile memory cell structure having an erase device
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Application No.: US15384323Application Date: 2016-12-20
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Publication No.: US10038003B2Publication Date: 2018-07-31
- Inventor: Wein-Town Sun , Wei-Ren Chen , Ying-Je Chen
- Applicant: eMemory Technology Inc.
- Applicant Address: TW Hsin-Chu
- Assignee: eMemory Technology Inc.
- Current Assignee: eMemory Technology Inc.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L27/11558 ; H01L27/12 ; H01L29/06 ; H01L27/11524 ; H01L29/08 ; H01L29/10 ; H01L29/423

Abstract:
A single-poly nonvolatile memory cell includes an SOI substrate having a semiconductor layer, a first OD region and a second OD region on the semiconductor layer, an isolation region separating the first OD region from the second OD region, a PMOS select transistor disposed on the first OD region, and a PMOS floating gate transistor disposed on the first OD region. The PMOS floating gate transistor is serially connected to the PMOS select transistor. The PMOS floating gate transistor comprises a floating gate overlying the first OD region. A floating gate extension is continuously extended from the floating gate to the second OD region and is capacitively coupled to the second OD region.
Public/Granted literature
- US20170207230A1 SINGLE-POLY NONVOLATILE MEMORY CELL STRUCTURE HAVING AN ERASE DEVICE Public/Granted day:2017-07-20
Information query
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