Invention Grant
- Patent Title: Non-volatile memory device including nano floating gate
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Application No.: US15228943Application Date: 2016-08-04
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Publication No.: US10038068B2Publication Date: 2018-07-31
- Inventor: Jun-Hyung Kim
- Applicant: SK INNOVATION CO., LTD.
- Applicant Address: KR Seoul
- Assignee: SK INNOVATION CO., LTD.
- Current Assignee: SK INNOVATION CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: IP & T Group LLP
- Priority: KR10-2013-0159736 20131219
- Main IPC: H01L29/788
- IPC: H01L29/788 ; H01L29/423 ; H01L21/28 ; H01L29/66 ; H01L29/49 ; H01L51/05 ; H01L27/11521 ; H01L29/51

Abstract:
A non-volatile memory device includes a floating gate for charging and discharging of charges over a substrate. The floating gate comprises a linker layer formed over the substrate and including linkers to be bonded to metal ions and metallic nanoparticles formed out of the metal ions over the linker layer.
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